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    • 专利摘要:

    公开号:NL1035788A1
    申请号:NL1035788
    申请日:2008-08-05
    公开日:2009-03-09
    发明作者:Sander Frederik Wuister；Johan Frederik Dijksman；Yvonne Wendela Kruijt-Stegeman；Ivar Schram；Jeroen Herman Lammers；Richard Joseph Marinus Schroeders
    申请人:Asml Netherlands Bv；
    IPC主号:
    专利说明:

    IMPRINT LITHOGRAPHY
    FIELD
    The present invention relates to imprint lithography.
    BACKGROUND
    In lithography, there is an ongoing desire to reduce the size of features in a lithographic pattern to increase the density of features on a given substrate area. In photolithography, the push for narrower features has in the development of technologies such as immersion lithography and extreme ultraviolet (EUV) lithography, which are, however, rather costly.
    A potentially less costly road to narrower features that has gained increasing interest is so-called imprint lithography, which generally involves the use of a "stamp" to transfer a pattern onto a substrate. An advantage of imprint lithography is that the resolution of the features is not limited by, for example, the wavelength of a radiation source or the numerical aperture of a projection system as in photolithography, but mainly just by the pattern density on the stamp (also referred to as a template). There are three main approaches to imprint lithography, examples of which are schematically depicted in Figures la to lc.
    Figure 1 a shows an example or a type of imprint lithography that is often referred to as micro-contact printing. Micro-contact printing involves transferring a layer of molecules 11 (typically an ink such as a thiol) from a template 10 on a resist layer 13 which is supported by a substrate 12 and planarization and transfer layer 12 ' . The template 10 has a pattern of features on its surface, the molecular layer being disposed upon the features. When the template is pressed against the resist layer, the layer of molecules 11 are transferred onto the resist. After removal of the template, the resist is etched such that the areas of the resist are not covered by the transferred molecular layer are etched down to the substrate. For more information on micro-contact printing, see, for example, United States patent no. 6,180,239.
    Figure 1b shows an example of so-called hot imprint lithography (or hot embossing). In a typical hot imprint process, a template 14 is imprinted into a thermosetting or a thermoplastic polymer resin 15, which has been cast on the surface of a substrate 12.
    The resin may for instance be spun coated and baked onto the substrate surface or as illustrated in the example, onto a planarization and transfer layer 12 '. When a thermosetting polymer resin is used, the resin is heated to a temperature such that, upon contact with the template, the resin is sufficiently flowable to flow into the pattern features defined on the template. The temperature of the resin is then increased to thermally cure (crosslink) the resin so that it solidifies and irreversibly adopts the desired pattern. The template may then be removed and the patterned resin cooled. In hot imprint lithography employing a layer of thermoplastic polymer resin, the thermoplastic resin is heated so that it is in a freely flowable state immediately prior to imprinting with the template. It may be necessary to heat a thermoplastic resin to a temperature considerably above the glass transition temperature of the resin. The template is pressed into the flowable resin and then cooled to below its glass transition temperature with the template in place to harden the pattern. Thereafter, the template is removed. The pattern will consist of the features in relief from a residual layer of the resin which may then be removed by an appropriate etch process to leave only the pattern features. Examples of thermoplastic polymer resins used in hot imprint lithography processes are poly (methyl methacrylate), polystyrene, poly (benzyl methacrylate) or poly (cyclohexyl methacrylate). For more information on hot imprint, see example United States patent nos. 4,731,155 and 5,772,905.
    Figure 1c shows an example of UV imprint lithography, which involves the use of a transparent template and a UV-curable liquid (the term "UV" is used here for convenience but should be interpreted as including any suitable actinic radiation for curing ). An UV curable liquid is often less viscous than the thermosetting and thermoplastic resins used in hot imprint lithography and consequently may move much faster to fill template pattern features. A quartz template 16 is applied to a UV-curable resin 17 in a similar manner to the process of Figure lb. However, instead of using heat or temperature cycling as in a hot imprint, the pattern is frozen by curing the resin with UV radiation that is applied through the quartz template onto the resin. After removal of the template, the pattern will consist of the features in relief from a residual layer of the resin which may then be removed by an appropriate etch process to leave only the pattern features. A particular way of patterning a substrate through UV imprint lithography is so-called step and flash imprint lithography (SFIL), which may be used to pattern a substrate in small steps in a similar manner to optical steppers conventionally used in 1C manufacture. For more information on UV imprint, see for example United States patent application publication no. 2004-0124566, United States patent no. 6,334,960, PCT patent application publication no. WO 02/067055, and the article by J. Haisma entitled "Mold- assisted nanolithography: A process for reliable pattern replication ", J. Vac. Sci. Technol. B14 (6), Nov / Dec 1996.
    Combinations of all or parts of the above imprint techniques are also possible. See, for example, United States patent application publication no. 2005-0274693, which mentions a combination of heating and UV curing an imprint material.
    SUMMARY
    [0008] When an imprint template is pushed into or against a surface into which a pattern is to be imprinted (for example, a layer of resist or other imprintable medium), gas (eg, air) may become trapped between the imprint template and the imprintable medium, and / or trapped in bubbles in the imprintable medium itself. Trapped gas, often referred to as gas inclusions (e.g., air inclusions), can lead to defects in the imprinted pattern. Therefore, it is desirable to reduce or eliminate gas inclusions.
    [0009] It is desirable, for example, to provide an apparatus and method which obviates or mitigates at least one disadvantage of the prior art, whether identified or elsewhere.
    According to an aspect of the invention, there is provided a chuck apparatus for holding a substrate, including the chuck apparatus comprises: a first surface portion on which the substrate is to be held; and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.
    According to an aspect of the invention, there is provided a method of directing gas over a substrate using a chuck apparatus, the chuck apparatus including a first surface portion on which the substrate is holdable; and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion; the method including: directing gas at the second surface portion, the second surface portion deflecting gas over the substrate.
    According to an aspect of the invention, there is provided an imprint lithography apparatus, including: an imprint template; a gas delivery apparatus arranged to deliver gas in the direction of a normal vector extending from a patterned surface of the imprint template such that, in use, gas is directed in between the imprint template and a surface which the imprint template has been brought into contact with.
    [0013] According to an aspect of the invention, there is provided a method of delivering gas relative to an imprint template, the method including: delivering gas in the direction of a normal vector extending from a patterned surface of the imprint template such that, in use, gas is directed in between the imprint template and a surface which the imprint template is brought to contact with.
    LETTER DESCRIPTION OF THE DRAWINGS
    Figures 1a-c schematically shows examples of, respectively, micro-contact printing, hot imprint, and UV imprint; Figures 2a-2b depict an imprint lithography apparatus and method; Figures 3a-3b depict an imprint lithography apparatus and method according to one or more expanded of the invention; Figures 4a-4b depict an imprint lithography apparatus and method according to one or more expanded of the invention; and Figures 5a-5c depict an imprint lithography apparatus and method according to one or more embodiments of the invention.
    DETAILED DESCRIPTION
    Figure 2a schematically depicts an imprint lithography apparatus. An imprint template 20 is hero in position by an imprint template chuck 21. The imprint template 20 may be moved about via movement of the imprint template chuck 21. One or more conduits 22 are provided which run alongside the imprint template chuck 21 and imprint template 20. The conduit] s) 22 opens adjacent to the imprint template 20. Although Figure 2a shows two conduits 22 extending along two sides of the imprint template 20, more (or less) conduits may extend alongside the imprint template 20. For example, one or more conduits may be used which extend around the imprint template 20 and imprint template chuck 21, and which open adjacent to the imprint template 20.
    Figure 2a also shows a substrate 23 provided with a layer or imprintable medium 24 (for example, resist). The substrate 23 is hero in position by a chuck 25. As can be seen from Figure 2 a, it is conventional in imprint lithography arrangements for the chuck 25 to substantially equal in width and perimeter (eg, diameter and circumference) to the substrate 23, such that the edge (s) or substrate 23 is in alignment with the edge (s) or substrate chuck 25. In an embodiment, the chuck is 25, is attached to or is an integral part of a substrate table ( not shown for clarity). In an embodiment, the chuck 25 may be an intermediate substrate carrier, which may be used as an intermediate structure to carry the substrate and hold it in position. The substrate carrier itself is then held in position on the substrate table (not shown for clarity). The term "chuck" used is intended to cover both the (intermediate) substrate carrier and the substrate table as mentioned previously.
    In use, the imprint template 20 is typically moved towards and brought into contact with the imprintable medium 24 provided on the substrate 23. As the imprint template 20 is brought into contact with the imprintable medium 24, gas 26 is passed through the conduit (s) 22. Alternatively, the gas 26 may be continuously passed through the conduit (s) 22. It can be seen from Figures 2a-b that the gas passes along the conduit (s) 22 and against the imprintable medium 24. A portion of the gas 26 will be deflected by the imprintable medium 24 and the substrate 23 and will pass between the imprint template 20 and the imprintable medium 24 which is about to be imprinted by the imprint template 20. The gas is used to accelerate the dissolution of gas inclusions between the imprint template 20 and the imprintable medium 24, and also gas inclusions in the imprintable medium 24. Where, for example, the imprint environment is air, a suitable gas 26 to be used is helium, although other gases such as nitrogen, carbon, hydrogen and xenon may also be used.
    In Figure 2a, it can be seen that when a pattern is imprinted away from the edge of the substrate 23 (eg in or around the center of the substrate 23), the gas 26 is deflected between the imprint template 20 and the imprintable medium 24. Referring now to Figure 2b, it can be seen when a pattern is to be imprinted in the imprintable medium 24 adjacent to the periphery of the substrate 23 (ie near the edge of the substrate), less gas is deflected by the substrate into the region between the imprint template 20 and the imprintable medium 24. Specifically, it can be seen that a portion of the gas 26a is not reflected by the substrate, and instead passes by the substrate 23, and passes alongside the substrate edge of the substrate 23 and chuck 25. This portion of the gas 26a is thus not used to accelerate the dissolution of gas inclusions. Because this gas portion 26a is not deflected between the imprint template 20 and the imprintable medium 24, the risk of gas inclusions remaining in the imprintable medium 24 is increased, or at the very least the time for the gas inclusions to dissolve is increased. If the gas inclusions are not eliminated or reduced, the pattern in which the gas inclusions are present may be defective. If the time tasks for the gas inclusions to dissolve is increased, further processing of the imprinted pattern may be delayed causing a reduction in throughput. It is therefore desirable to reduce or eliminate the possibility of gas inclusions, and if they do form, reduce the time tasks for the gas inclusions to dissolve.
    Figure 3a depicts an embodiment of the present invention. Figure 3a shows that the chuck 25 has been extended by the provision of an extension 30. The extension 30 may be formed from any suitable material, for example, the same material as the chuck 25. It can be seen from Figure 3a that the extension 30 serves to deflect gas 26 between the imprint template 20 and the imprintable medium 24 even when a pattern has been imprinted on the periphery of the substrate 23. In other words, Figure 3a depicts a chuck apparatus (ie an apparatus including a chuck) provided with two surface portions: a first surface portion on which a substrate may be hero, and a second surface portion which, in use, is used to deflect gas between the imprint template and the substrate (and imprintable medium). It can be seen that the extension 30 extends away from the edge of the chuck 25 and substrate 23. The extension 30 may extend by any suitable amount. To a limit, the further that the extension 30 extends away from the chuck 25, the more likely it is that gas 26 may be deflected between the imprint template 20 and the imprintable medium 24. However, up to a certain distance away from the substrate 23 and chuck 25, any increase in the degree to which the extension 30 extends away from the chuck 25 will have little effect. Suitable ranges for the distance which the extension 30 extends away from the chuck 25 and substrate 23 are 0.1 cm to 100 cm, and 1 cm to 5 cm may be advantageous.
    Figure 3a shows that an extension is provided on one side of the chuck 25 and substrate 23. In practice, it is likely that an extension will be provided at various points around the chuck 25, and that the extension may be provided continuously on the chuck 25. For example, the extension 30 may be a ring (or similar) or material which surrounds the chuck 25. Alternatively, instead of providing an independent extension 30, a larger chuck may be used to hold the substrate. Figure 3b shows that a chuck 40 has been used to hold the substrate 23, and that the chuck 40 extends beyond the edge (s) of the substrate 23. Although Figure 3b depicts the chuck 40 having a region 40a which extends beyond an edge of the substrate 23, it is likely that in practice the chuck 40 would be provided with more than one region which extends beyond an edge of the substrate 23, and desirably a region which extends beyond all the edge (s) of the substrate 23. For example, the chuck 23 may have a larger diameter than the substrate 23 which it is designed to hold.
    In use, it can be seen from Figure 3b that even when patterns are imprinted on an edge of the substrate 23, gas 26 is deflected by the region 40a which extends beyond the edge of the substrate 23, so that the gas is directed between the imprint template 20 and the substrate 23.
    [0026] In summary, it can be seen that the figures of 3a and 3b improve the delivery of gas between the imprint template 20 and the substrate 23 at an edge of the substrate 23. This is because the extension (or extended region) may be used to, in use, direct gas toward (ie in the direction of) a normal vector extending from the chuck (and / or the substrate if carried by the chuck).
    Figure 4a depicts a further embodiment of the present invention. In this embodiment, it can be seen that the chuck 25 has been provided with a shaped extension 50. The shaped extension 50 is provided adjacent to the edge of the chuck 25 and substrate 23. It can be seen that the shaped section 50 has an angled face which is angled towards the chuck 25 and substrate 23. The shaped extension 50 is shaped and sized so it does not make physical contact with the imprint template 20 during imprinting.
    Figure 4a that gas 26 which leaves the conduit (s) 22, and which is directed outside of an edge of the substrate 23 and chuck 25 is deflected between the imprint template 20 and the imprintable medium 24 by the shaped extension 50. In other words, Figure 4a depicts a chuck apparatus (ie an apparatus including a chuck) provided with two surface portions: a first surface portion on which a substrate may be hero, and a second surface portion which, in use, is used to deflect gas between the imprint template and the substrate (and imprintable medium). The shaped extension 50 decreases the amount of wasted gas 26, and increases the amount of gas 26 deflected between the imprint template 20 and the substrate 23. Therefore, using the embodiment of the invention, gas inclusions may be eliminated, reduced in number, and / or the time tasks for gas inclusions to dissolve may be reduced.
    Figure 4b depicts an embodiment similar to that described in relation to Figure 4a. Referring to Figure 4b, it can be seen that a chuck 60 is provided which extends beyond an edge of the substrate 23. That is, for example, the chuck 60 has a greater diameter than the substrate 23. It can be seen that the chuck 60 is provided with an integral shaped section 60a which, as described above in relation to Figure 4a, is, in use, used to deflect gas 26 between the imprint template 20 and the imprintable medium 24. The integral shaped section 60a is shaped and sized so that it does not make physical contact with the imprint template 20 during imprinting. The integral shaped section 60a reduces the amounts of wasted gas 26, increases the amount of gas 26 deflected between the imprint template 20 and the substrate 23. Therefore, using the embodiment of the invention, gas inclusions may be eliminated, reduced in number, and / or the time tasks for gas inclusions to dissolve may be reduced.
    In Figures 4a and 4b, the shaped section or extension is only shown on one side of the chuck and substrate. However, it will be appreciated that the shaped section or extension may be provided at more than one location around the edge (s) of the substrate and chuck. In practice, the shaped section or integral extension may extend around all the edge (s) or the chuck. That is, the shaped section may form a ring which may be placed around the chuck, or which may form an integral part of the chuck. It can be seen that the shaped section or extension (in whatever form provided) extends away from the edge (s) or the chuck and substrate. The extension or section may extend by any suitable amount. To a limit, the further that the extension or section extends away from the chuck, the more likely it is that gas may be deflected between the imprint template and the imprintable medium. However, up to a certain distance away from the substrate and chuck, any increase in the degree to which the extension or section extends away from the chuck will have little effect. Suitable ranges for the distance which the extension or section extends away from the chuck and substrate are 0.1 cm to 100 cm, and 1 cm to 5 cm may be advantageous. 10031] In Figures 4a and 4b, the shape section or extension is shown as having an angled surface which is flat. It will however be appreciated that the shaped section or extension may have an angled surface which is not flat. For example, the shaped section or extension may be provided with a curved surface which may be used to, in use, direct gas in between the imprint template and the substrate. In other words, the shaped section or extension may be used to, in use, direct gas toward (i.e., in the direction of) a normal vector extending from the chuck (and / or the substrate if carried by the chuck).
    Figure 5a depicts a further embodiment of the present invention. Figure 5a shows that the conduit (s) 22 through which gas 26 flows towards the substrate 23 is provided with a deflector 70. The deflector 70 is angled inwardly towards the imprint template 20 (eg toward an axis passing through the center of the imprint template 20 and extending perpendicularly away from the surface of the imprint template 20). The deflector 70 may be attached to the conduit (s) 22, or be an integral part of the conduit (s) 22.
    5a that, in use, gas 26 emerging from the conduit (s) 22 is deflected by the deflector 70 such that the gas 26 is directed, for example, underneath the imprint template 20. It can also seen that the gas 26 is directed, for example, beneath the imprint template 20, and between the imprint template 20 and the substrate 23, even when the imprint template 20 has been used to imprint patterns at the periphery of the substrate 23. This means that, in contrast to conventional methods, the incorporation of the deflector 70 decreases the amount of wasted gas 26, and increases the amount of gas 26 deflected between the imprint template 20 and the substrate 23. Therefore, using the embodiment of the invention , gas inclusions may be eliminated, reduced in number, and / or the time tasks for gas inclusions to dissolve may be reduced.
    [0034] It can be seen from Figure 5a that all the conduit (s) 22 is provided with the deflector 70. This may not be essential, and in an embodiment, all the conduit (s) 22 may not be provided with a deflector 70. The deflector 70 of the or each conduit 22 may be angled inwardly towards the imprint template 20 at a different angle depending on the location of the conduit 22 and / or deflector 70.
    Figures 5b and 5c depict a further embodiment of the invention, which is a slight modification of the embodiment described in relation to Figure 5a above. In Figures 5b and 5c, it can be seen that the deflector 70 is moveable. For example, in Figure 5b it can be seen that the deflector 70 is in alignment with the conduit 22. In contrast, it can be seen that in Figure 5c the deflector 70 has been rotated inwardly towards the imprint template 20. It may be desirable to change the orientation of the deflector 70 depending on the location of the imprint template 20 relative to the part of the substrate on which a pattern is to be imprinted. For example, when patterns are imprinted in or around the center of the substrate, the deflector 70 may not need to be rotated inwardly towards the imprint template 20, and can instead be aligned with the conduit 22. When patterns are to be imprinted on the periphery of the substrate 23, it may be desirable to ensure that gas 26 is deflected between the imprint template 20 and the substrate 23, instead of being able to bypass the substrate 23. The deflector 70 could be rotatable from the first configuration, for example when it is in alignment with the conduit 22 to a second configuration, for example when the deflector 70 is angled inwardly towards the imprint template 20, such that gas 26 is then directed between the imprint template 20 and the substrate 23. Alternatively or additionally , the deflector 70 could be moveable to any particular angle to change the angle of deflection of gas 26 exiting the conduit 22.
    Figures 5a to 5c depict a deflector and its use for deflecting gas emerging from a conduit. The deflector is not essential. Instead, the conduit could be shaped or oriented such that gas emerged from the conduit and is directed to between the imprint template and the substrate. For example, the conduit could be curved or have an angled section. As with the deflector shown in Figures 5b and 5c, the conduit could be moveable from a first configuration, where gas is not directed to between the imprint template and the substrate, to a second configuration, where gas is directed to between the imprint template and the substrate. The conduit could have been moved using any sort of actuator.
    The conduit, whether moveable or not, and with or without the deflector, may be generically referred to as a gas delivery apparatus. In general, the gas delivery apparatus is arranged to deliver gas in the direction of the imprint template, for example toward an axis passing through the center of the imprint template 20 and extending perpendicularly away from a patterned surface of the imprint template 20 (the patterned region of the imprint template is the part of the imprint template that will be used to imprint a pattern). In other words, the gas delivery apparatus is arranged to deliver gas in the direction of a normal vector extending from a patterned surface of the imprint template. That is, in use, gas is directed in between the imprint template and a surface which the imprint template is brought into contact with (e.g., imprintable medium). This is in contrast to conventional methods and apparatus (as, for example, can be seen in Figure 2), where the gas delivery apparatus delivers gas away from the imprint template. The gas delivery apparatus (e.g., the conduit and / or the deflector) are designed (e.g., shaped and sized) such that they do not impact upon the surface of the substrate during the imprinting process.
    One or more of the features of the above can be combined. For example, the deflector (moveable or not) or Figures 5a to 5c could be used in conjunction with the extension / section and / or shaped extension / section or Figures 3 and 4.
    [0039] It will be appreciated by one of the ordinary skill in the art that has been described above by way of example only. It can be appreciated by one of the ordinary skill in the art that various modifications may be made to these and other without departing from the invention, which is defined by the claims that follow. 10040) Other aspects of the invention are set out in the following numbered clauses.
    Clauses: 1. A chuck apparatus for holding a substrate, including the chuck apparatus: a first surface portion on which the substrate is to be held; and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion. 2. The chuck apparatus or clause 1, where the second surface portion is substantially flat. 3. The chuck apparatus of clause 1, in which the second surface portion defines a surface which is angled inwardly toward the first surface portion. 4. The chuck apparatus of clause 1, in which the second surface portion defines a flat surface which is angled inwardly toward the first surface portion. 5. The chuck apparatus of clause 1, the second surface portion defines a curved surface which is angled inwardly toward the first surface portion. 6. The chuck apparatus of clause 1, the first surface portion and second surface portions are integral parts of a chuck which is larger in width than the substrate which the chuck is designed to hold. 7. The chuck apparatus or clause 1, the first surface portion is provided by a chuck, and the second surface portion is provided by a separate extension located adjacent to an edge of the chuck. 8. The chuck apparatus of clause 7, the extension extends around a part of an edge of the chuck. 9. The chuck apparatus of clause 7, the extension extends around the chuck. 10. The chuck apparatus of clause 1, being at least the first surface portion being at least a part of an intermediate substrate carrier. 11. The chuck apparatus of clause 1, at least the first surface portion, at least a part of a substrate table. 12. The chuck apparatus of clause 1, arranged to hold a substrate on which patterns are imprinted using imprint lithography. 13. A method of directing gas over a substrate using a chuck apparatus, the chuck apparatus including a first surface portion on which the substrate is holdable; and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion; the method including: directing gas at the second surface portion, the second surface portion deflecting gas over the substrate. 14. An imprint lithography apparatus, including an imprint template chuck configured to hold an imprint template; and a gas delivery apparatus arranged to deliver gas in a direction toward a normal vector extending from a patterned surface of the imprint template such that, in use, gas is directed in between the imprint template and a surface which the imprint template is brought to into contact with. 15. The apparatus of clause 14, the gas delivery apparatus includes a conduit. 16. The apparatus of clause 15, where the conduit is shaped to deliver gas in the direction. 17. The apparatus of clause 15, where the conduit is moveable from a first configuration, where gas is not delivered in the direction, to a second configuration where gas is delivered in the direction. 18. The apparatus of clause 15, where the conduit is provided with a deflector to deflect the gas as it emerges from the conduit. 19. The apparatus of clause 18, where the deflector is shaped to deflect gas in the direction. 20. The apparatus of clause 18, where the deflector is moveable from a first configuration, where gas is not deflected in the direction, to a second configuration where gas is deflected in the direction. 21. A method of delivering gas relative to an imprint template, the method including: delivering gas in the direction of a normal vector extending from a patterned surface of the imprint template such that, in use, gas is directed between the imprint template and a surface which the imprint template has been brought into contact with. 22. The method of clause 21, including delivered the gas using a conduit provided with a deflector. 23. The method of clause 21, including delivering the gas in the direction when the imprint template is brought into contact with an area or a surface adjacent to an edge of the surface. 24. The method of clause 21, including delivering the gas using a moveable conduit and moving the conduit to deliver gas in the direction when the imprint template is brought into contact with an area or a surface adjacent to an edge of the surface. 25. The method of clause 21, including delivering the gas using a conduit provided with a moveable deflector and moving the deflector to deliver gas in the direction when the imprint template is brought into contact with an area or a surface adjacent to an edge of the surface.
    权利要求:
    Claims (1)
    [1]
    A clamping device for holding a substrate, characterized in that the clamping device comprises: a first surface portion on which the substrate will be held; and a second surface portion adjacent to the first surface portion and protruding at least partially around an edge of the first surface portion and which, during use, is adapted to deflect gas over the first surface and consequently the substrate that will be retained on the first surface part.
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    优先权:
    申请号 | 申请日 | 专利标题
    US89675007|2007-09-05|
    US11/896,750|US8144309B2|2007-09-05|2007-09-05|Imprint lithography|
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